Microwave Excited Plasmas

Microwave Excited Plasmas by M. Moisan, published by Elsevier Science on November 6, 1992, spans 519 pages and is presented in English. This volume explores the capabilities of microwave plasmas, highlighting their applications across various fields, including analytical chemistry, materials processing, and telecommunications. The book discusses how these plasmas can generate ions and reactive neutral species essential for etching and deposition processes, as well as their role in dissociating molecules and exciting atoms for analytical purposes.
Readers will find a comprehensive review of current developments in microwave discharges, along with a synthesis that outlines relevant physical references while minimizing complex plasma theory. The text addresses the versatility and cost-effectiveness of microwave plasmas, making it appealing to both industrial entrepreneurs and plasma experts. The book emphasizes practical applications, showcasing how microwave plasmas can be utilized in processes ranging from metallurgical treatment to laser and lighting applications, covering an extensive pressure range from 10-3 Pa to above atmospheric pressure.
Official synopsis Publisher
The contrasting examples of microwave plasmas given in this volume demonstrate their capability of not only covering the totality of expressed needs in that particular field, but in many others. For example the ions and reactive neutral species, indispensable for the synergetic effects in etching and deposition processes can be used in metallurgical treatment, and for materials processing in general. They also have the ability to dissociate molecules and excite atoms as required in analytical chemistry where the information on the constituent concentrations is obtained through optical spectroscopy or mass spectrometry. Finally, microwave plasmas can supply the photons for laser and lighting applications. It is noteworthy that microwave plasmas cover an impressive pressure range of eight orders of magnitude from 10-3 Pa (10-5 torr) to above atmospheric pressure. The versatility of microwave plasmas, their moderate cost, and their ease of implementation particularly appeal to the industrial entrepreneur.
As well as providing a review of current developments, the work proposes a synthesis on microwave discharges, laying out the corresponding physical references without developing too much plasma theory. It will be of interest both to the user, who may not be overly concerned about plasma science, and to the plasma expert, who may wish to redirect his interest towards plasma applications, such as materials processing.
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