Focused Ion Beam Systems Basics and Applications

Focused Ion Beam Systems Basics and Applications by Nan Yao, published by Cambridge University Press on April 14, 2011, is a comprehensive resource that delves into the principles and applications of focused ion beam (FIB) technology. This reissue edition spans 408 pages and is presented in English. The book explores the FIB system as a crucial tool for manipulating material structures at the nanoscale, detailing its integration with electron beams to create a DualBeam system that serves multiple functions, including imaging and sample modification.
Readers will find an in-depth examination of the fundamental principles of ion beam technology, including its interaction with materials, etching, deposition, and in situ characterization. The text also addresses sample preparation and three-dimensional reconstruction, emphasizing applications in biomaterials and nanotechnology. This volume serves as a valuable reference for researchers in fields such as materials science, electrical engineering, and nanotechnology, providing insights into the advantages and optimal implementation of various ion beam methods.
Official synopsis Publisher
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam – a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
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