High Resolution X-Ray Diffractometry And Topography

High Resolution X-Ray Diffractometry And Topography by D. Keith Bowen, published by CRC Press LLC on October 10, 2019, is a comprehensive resource that addresses the increasing demand for advanced techniques in the examination and characterization of electronic materials. This edition spans 264 pages and is presented in English, focusing on the theoretical and practical aspects of x-ray diffraction, particularly in the context of single crystal materials.

Readers will find a detailed exploration of modern techniques applicable in both research and industrial settings, emphasizing the importance of high-resolution x-ray diffraction and topography. The book combines mathematical formalisms with graphical explanations, offering practical advice for data interpretation. Topics such as crystallography, optics, and materials science are woven throughout, making this work a valuable reference for those engaged in the fields of chemistry, physics, and engineering.